发明名称 ADSORPTION RATE MEASURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device for easily measuring a parameter to be used as an index of a gas adsorption rate in adsorbent. SOLUTION: The adsorption rate measuring device is provided with a pressure vessel with adsorbent having an adsorbent housing means housing the adsorbent in an interior, a pressure producing means applying pressure by measuring object gas to the pressure vessel with adsorbent, and a pressure feeding means feeding the measuring object gas pressure produced by the pressure producing means to the pressure vessel with adsorbent. It is characterized by that it is provided with a gas flow rate measuring means measuring a time series change of flow rate of the measurement object gas flowing between the pressure vessel with adsorbent and the pressure producing means, and a calculating means calculating the adsorption rate of the adsorbent from the gas flow rate measured by the gas flow rate measuring means.
申请公布号 JP2002310877(A) 申请公布日期 2002.10.23
申请号 JP20010109741 申请日期 2001.04.09
申请人 TEIJIN LTD 发明人 NAKAMURA HITOSHI
分类号 G01N7/02;(IPC1-7):G01N7/02 主分类号 G01N7/02
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