| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus and its method capable of excellently cleaning terminal parts formed in a substrate. SOLUTION: A substrate 20 is pinched between rollers 11a, 11b, while being brought into contact with the upper face in the rim part (a terminal part 21) and the lower face in the rim part of the substrate 20, cleaning cloths hooked around the rollers 11a, 11b (not illustrated) are relatively moved by distance a [mm] along the rim parts of the substrate 20 by a moving apparatus (not illustrated) to clean the upper face of the rim part (the terminal part 21) and the lower face of the rim part (Fig. 2 (a)). After that, in the same manner, steps of application of a solvent for cleaning to the cleaning cloths 12a, 12b, pinching of the substrate 20 by the rollers 11a, 11b, and the relative movement of the rollers in relation to the substrate 20 are repeated a plurality of times until the cleaning of the rim parts of one side of the substrate 20 is finished and thus the upper face of the rim part (the terminal part 21) and the lower face of the rim part of the substrate 20 with the cleaning cloths (not illustrated) are cleaned a plurality of times.
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