发明名称 |
HIGH FREQUENCY SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To solve a problem that a parasitic capacitance must be taken into account in high frequency design because parasitic capacitance exists in an inductance element formed of a line conductor on a ground plate while sandwiching an interlayer insulating film. SOLUTION: Since parasitic capacitance due to a dielectric interposed between an inductance element and the ground potential can be eliminated by removing a ground plate directly under the inductance element and providing a gap, a high frequency semiconductor device having good characteristics can be obtained.</p> |
申请公布号 |
JP2002299554(A) |
申请公布日期 |
2002.10.11 |
申请号 |
JP20010099960 |
申请日期 |
2001.03.30 |
申请人 |
FUJITSU QUANTUM DEVICES LTD |
发明人 |
MIMINO YUTAKA;BABA OSAMU;AOKI YOSHIO;GOTO MUNEHARU |
分类号 |
H01L21/822;H01F17/00;H01F27/34;H01L21/02;H01L23/522;H01L27/04;H01L27/08;(IPC1-7):H01L27/04 |
主分类号 |
H01L21/822 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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