发明名称 HIGH FREQUENCY SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To solve a problem that a parasitic capacitance must be taken into account in high frequency design because parasitic capacitance exists in an inductance element formed of a line conductor on a ground plate while sandwiching an interlayer insulating film. SOLUTION: Since parasitic capacitance due to a dielectric interposed between an inductance element and the ground potential can be eliminated by removing a ground plate directly under the inductance element and providing a gap, a high frequency semiconductor device having good characteristics can be obtained.</p>
申请公布号 JP2002299554(A) 申请公布日期 2002.10.11
申请号 JP20010099960 申请日期 2001.03.30
申请人 FUJITSU QUANTUM DEVICES LTD 发明人 MIMINO YUTAKA;BABA OSAMU;AOKI YOSHIO;GOTO MUNEHARU
分类号 H01L21/822;H01F17/00;H01F27/34;H01L21/02;H01L23/522;H01L27/04;H01L27/08;(IPC1-7):H01L27/04 主分类号 H01L21/822
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