发明名称 |
Ester compounds, polymers, resist composition and patterning process |
摘要 |
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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申请公布号 |
US6444396(B1) |
申请公布日期 |
2002.09.03 |
申请号 |
US20000630810 |
申请日期 |
2000.08.02 |
申请人 |
SHIN-ETSU CHEMICAL CO. |
发明人 |
WATANABE TAKERU;KINSHO TAKESHI;NISHI TSUNEHIRO;NAKASHIMA MUTSUO;HASEGAWA KOJI;HATAKEYAMA JUN |
分类号 |
C07C69/03;C07C69/00;C07C69/753;C08F32/08;G03F7/004;G03F7/039;(IPC1-7):G03F7/039;C08F10/00 |
主分类号 |
C07C69/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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