CARBON FILM FORMING METHOD, MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a carbon film depositing method by which a carbon film with which no contaminant is mixed can be deposited without sputtering the structure member of a CVD(chemical vapor deposition) device. SOLUTION: The carbon film (DLC film) is deposited by a CVD method by introducing a raw material gas and gas (auxiliary discharge gas) of an element (He, Ne or the like) having a mass number smaller than that of Ar into a chamber 21 of the CVD device.