发明名称 PARTS OF APPARATUS FOR PLASMA TREATMENT AND METHOD FOR MANUFACTURE THEREOF, AND APPARATUS FOR PLASMA TREATMENT
摘要 Parts of an apparatus for plasma treatment which is to be disposed inside of the body of the apparatus and to be exposed to a plasma atmosphere (a focus ring, a shield ring, a protecting ring, a shielding member, and a first or second bellows cover), characterized in that they are formed of one of a polybenzimidazole material having been subjected to a drying treatment, a sintered ceramic material and a material containing a silicon oxide as a primary component and another material specified.
申请公布号 WO02067312(A1) 申请公布日期 2002.08.29
申请号 WO2002JP01527 申请日期 2002.02.21
申请人 TOKYO ELECTRON LIMITED;IMAFUKU, KOSUKE;NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI;HIDA, TSUYOSHI 发明人 IMAFUKU, KOSUKE;NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI;HIDA, TSUYOSHI
分类号 H01J37/32;(IPC1-7):H01L21/306 主分类号 H01J37/32
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