发明名称 |
PARTS OF APPARATUS FOR PLASMA TREATMENT AND METHOD FOR MANUFACTURE THEREOF, AND APPARATUS FOR PLASMA TREATMENT |
摘要 |
Parts of an apparatus for plasma treatment which is to be disposed inside of the body of the apparatus and to be exposed to a plasma atmosphere (a focus ring, a shield ring, a protecting ring, a shielding member, and a first or second bellows cover), characterized in that they are formed of one of a polybenzimidazole material having been subjected to a drying treatment, a sintered ceramic material and a material containing a silicon oxide as a primary component and another material specified.
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申请公布号 |
WO02067312(A1) |
申请公布日期 |
2002.08.29 |
申请号 |
WO2002JP01527 |
申请日期 |
2002.02.21 |
申请人 |
TOKYO ELECTRON LIMITED;IMAFUKU, KOSUKE;NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI;HIDA, TSUYOSHI |
发明人 |
IMAFUKU, KOSUKE;NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI;HIDA, TSUYOSHI |
分类号 |
H01J37/32;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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