| 摘要 |
<p>A lens-barrel and an exposure device allowing the inside of the lens-barrel to be efficiently purged with specified gas and capable of emitting passing beam while maintaining the high energy thereof, and a method of manufacturing a device by using the exposure device; the exposure device used for the manufacture of the device, comprising an exposure light source (11), an illuminating optical system (17), and a lens-barrel (40) storing a projection optical system PL, the lens-barrel (40) further comprising a lens-barrel body (41), a cover (42) for covering a part thereof, and lens elements (43, 45), wherein purge gas inlets (60) for feeding purge gas are provided in the partial lens-barrels (41a, 41i) of the lens-barrel body (41), and a gas outlet (61) for discharging the gas in the lens-barrel (40) is provided at approximately the center of the cover (42), and partition walls (54) for limiting the exposure of piezo elements (49) to the inside of the lens-barrel body (41) are provided on the inner peripheral side of the lens-barrel body (41) at the portions corresponding to the piezo elements (49).</p> |
