发明名称 Sample processing apparatus and method
摘要 This invention prevents defects generated when a bonded substrate stack having a separation layer is separated. A bonded substrate stack (101) having a porous layer (101b) is separated in two steps of the first and second processes. In the first process, a jet is ejected to the porous layer (101b) while rotating the bonded substrate stack (101) to partially separate the bonded substrate stack (101) while leaving the central portion of the porous layer (101b) as an unseparated region. In the second process, the jet is ejected to the porous layer (101b) while rotation of the bonded substrate stack (101) is stopped. A force is applied to the unseparated region from a predetermined direction to completely separate the bonded substrate stack (101). Also, the first region (peripheral portion) and second region (central portion) of the bonded substrate stack (101) having the porous layer (101b) are separated using a jet and ultrasonic wave, respectively. More specifically, the first region is separated by a jet ejected from a nozzle (102) while rotating the bonded substrate stack (101). On the other hand, the second region is separated by an ultrasonic wave generated by an ultrasonic vibrator (1203).
申请公布号 US6427748(B1) 申请公布日期 2002.08.06
申请号 US19990359575 申请日期 1999.07.22
申请人 CANON KABUSHIKI KAISHA 发明人 YANAGITA KAZUTAKA;YONEHARA TAKAO;OMI KAZUAKI;SAKAGUCHI KIYOFUMI
分类号 H01L21/00;(IPC1-7):B32B35/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址