METHOD OF EVALUATING WIRING AND WIRING EVALUATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of evaluating a wiring which can estimate duration of the electro-migration of the wiring in the middle of the manufacturing process of a semiconductor device, and to provide a wiring evaluation device. SOLUTION: In a method of evaluating a wiring, the preparation 21 of a sample formed with an evaluation wiring pattern for evaluation is made. A measurement 22 of the resistance values of the pattern at room temperatures is carried out. A measurement 23 of the resistance value of the pattern at a low temperature is carried out. A calculation 24 of the ratio (room temperatures/low temperature) of the electric resistance of the pattern at the time of the room temperatures to the electric resistance of the pattern at the time of the low temperature is performed. The electric resistance ratio found by the calculation 24 is applied to the correlation between the previously found electric resistance ratio and the duration of the electro-migration of the wiring, whereby an estimation 25 of the duration of the electro-migration(EM) of the pattern is made.