发明名称 Method and apparatus for vapor generation and film deposition
摘要 A vapor generator (19, 62) and connected chemical vapor deposition chamber (28) for providing a vapor for operations such as chemical vapor deposition has an atomizer (16, 16A, 38, 50) for forming an aerosol or droplet spray (36, 58, 74, 80) separate from a vaporization chamber (19, 62). The aerosol is passed into a heated vaporization chamber (19, 62) wherein the particles or droplets are flash vaporized and larger droplets are vaporized by direct contact with heated surfaces. The resulting gas/vapor stream is then used for chemical vapor deposition, in a separate chemical vapor deposition chamber (26). The vapor and gas stream is preferably passed through a restricted passageway (22, 44, 68) for mixing before being introduced into the chemical vapor deposition chamber (26).
申请公布号 US6409839(B1) 申请公布日期 2002.06.25
申请号 US19990435515 申请日期 1999.11.08
申请人 MSP CORPORATION 发明人 SUN JAMES J.;LIU BENJAMIN Y. H.
分类号 C23C16/448;(IPC1-7):C23C16/00 主分类号 C23C16/448
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