| 摘要 |
<p>A substrate inspection apparatus (1-1) (Fig.1) carries a substrate (S), an inspection object, into an inspection room (23-1), keeps the inspection room vacuumized and free from vibration, continously transfers the substrate on a stage (26-1) with at least one degree of freedom for irradiation by an electron beam with a specific width, allows the beam to reach the surface of the substrate via a primary electron optical system (10-1), traps secondary electrons generated from the substrate via a secondary electron optical system (20-1) for leading to a detection system (35-1), forms a secondary election image by an image processing system based on the detection signal of a secondary electron beam obtained from the detection system, detects the defective position of the substrate based on the secondary electron image formed by the image processing system, displays and/or stores the defective position by the CPU (37-1), and carries the inspected substrate out of the inspection room, whereby continously inspecting the defect of the substrate with high accuracy, efficiency and throughput.</p> |
