| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative type chemical amplification type resist composition for electron beams or X-rays which satisfies various characteristics such as sensitivity, resolution, resist shape, development defects, suitability to coating and solubility in a solvent when electron beams or X-rays are used. SOLUTION: The negative type resist composition contains (A) an alkali- soluble resin, (B) a radiation sensitive acid generating agent, (C) a crosslinker which causes crosslinking under the action of an acid and (D) a mixed solvent containing at least one selected from the group A comprising propylene glycol monoalkyl ether carboxylates and at least one selected from the group B comprising propylene glycol monoalkyl ethers, alkyl lactates, acetic esters, chain ketones and alkyl alkoxypropionates or a mixed solvent containing at least one selected from the group A and at least one selected from the group C comprising γ-butyrolactone, ethylene carbonates and propylene carbonate. |
