PHASE-SHIFT PHOTOMASK FOR PATTERNING HIGH DENSITY FEATURES,申请号KR1020017016662-传众专利搜索

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发明名称	PHASE-SHIFT PHOTOMASK FOR PATTERNING HIGH DENSITY FEATURES
摘要
申请公布号	KR20020036962(A)	申请公布日期	2002.05.17
申请号	KR1020017016662	申请日期	2001.12.26
申请人		发明人
分类号	G03F1/08	主分类号	G03F1/08
代理机构		代理人
主权项
地址

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