发明名称 METHOD OF FABRICATING A SEMICONDUCTOR DEVICE OF HIGH-VOLTAGE CMOS STRUCTRE
摘要 A transistor of a second conductivity type is of an LMOS structure, and a transistor of a first conductivity type is of an LDMOS structure. The transistor of the first conductivity type has a drain base layer which functions in the same manner as a drain offset diffusion layer and is formed in a substrate separately from a source base diffusion layer. The transistor of the first conductivity type has a stably high breakdown voltage and a low on-state resistance as with the transistor of the second conductivity type.
申请公布号 US2002048914(A1) 申请公布日期 2002.04.25
申请号 US20010964393 申请日期 2001.09.28
申请人 KOBAYASHI KENYA 发明人 KOBAYASHI KENYA
分类号 H01L29/786;H01L21/336;H01L21/77;H01L21/8238;H01L21/84;H01L27/092;H01L27/12;(IPC1-7):H01L21/00;H01L21/823;H01L21/22;H01L21/38 主分类号 H01L29/786
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