发明名称 |
Optical article, exposure apparatus or optical system using it, and process for producing it |
摘要 |
An exposure apparatus having an illumination light source and a stage for an exposed object to be mounted thereon, in which at least one of an illumination optical system and a projection optical system includes a plurality of optical articles in each of which a first optically transparent thin layer and a second optically transparent thin layer having a higher refractive index than that of the first optically transparent thin layer are laminated on a surface of a substrate. At least one of the first and second optically transparent thin layers includes a layer of oxides or fluorides and atoms of at least one selected from the group consisting of krypton, xenon and radon, in which the content of the atoms is within a range of from 0.5 atomic ppm to 1 atomic %, inclusive.
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申请公布号 |
US6372646(B2) |
申请公布日期 |
2002.04.16 |
申请号 |
US19990386358 |
申请日期 |
1999.08.31 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OHMI TADAHIRO;HARADA KAZUYUKI;TANAKA NOBUYOSHI |
分类号 |
G02B5/28;C23C14/06;C23C14/08;C23C14/10;G02B1/11;G03F7/20;G03F9/00;H01L21/027;H01S3/101;(IPC1-7):H01L21/302;H01L21/461;G03C5/00;C23C14/00;C23C14/32 |
主分类号 |
G02B5/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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