| 摘要 |
PROBLEM TO BE SOLVED: To improve cooling efficiency of a plasma CVD apparatus. SOLUTION: This plasma CVD apparatus comprises a reaction vessel 11, a heater cover 13 for supporting a substrate 14 arranged in the reaction vessel 11, a radical heater 16 arranged in the reaction vessel 11 so as to face the substrate 14, a cartridge heater 18 arranged inside of the above reaction vessel 11, so as to in the side opposite to the above radial heater 16 with the above heater cover 13 therebetween, and a cooling and reflecting unit 19 having a cooling function and a reflecting function to radiant heat of the above cartridge heater, at least arranged in the above reaction vessel and at the back side of the cartridge heater 18.
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