METHOD AND APPARATUS FOR MANUFACTURING COMPOUND OXIDE THIN FILM

摘要

PURPOSE: To provide a method and an apparatus for manufacturing a compound oxide thin film, which can efficiently manufacture a compound oxide thin film with high reliability besides high dielectric constant, using a cheap material without requiring a complicated process. CONSTITUTION: This method for forming the compound oxide thin film comprises directly introducing a metal compound solution 10 of a sprayed condition by two fluid nozzle 2 into a film forming chamber 3 kept under pressure of 100 Torr or less. The gas used for the two hydraulic nozzles comprises a gas including oxidizing gas. A solvent for dissolving a metal compound comprises having a boiling point of 100°C or more under a normal pressure.