发明名称 |
GAS INJECTOR FOR SEMICONDUCTOR MANUFACTURING DEVICE |
摘要 |
PURPOSE: To provide a gas injector for semiconductor manufacturing device the process gas injecting extent of which can be limited correspondingly to the diameters of a plurality of wafers. CONSTITUTION: The process gas injecting extent of this gas injector is limited to a prescribed extent by sealing an injection port 213 from which the injection of a process gas is to be stopped with an injection limiting member 215. In addition, the process gas injecting extent is changed correspondingly to the diameters of the wafers by changing the size of the member 215 which is detachably attached to an injecting section 20.
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申请公布号 |
KR20020004782(A) |
申请公布日期 |
2002.01.16 |
申请号 |
KR20000054763 |
申请日期 |
2000.09.19 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. |
发明人 |
TOMIYAMA TOMOHIKO |
分类号 |
B05B1/12;C23C16/455;H01L21/205;H01L21/31;(IPC1-7):H01L21/205 |
主分类号 |
B05B1/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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