发明名称 ETCHING TREATING METHOD AND SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an etching treating method by which operability by the safe and secure performance of the regeneration of a cleaned member attached with a deposited film by wet etching treatment can be improved, and further, the maintenability of an etching treating system can remarkably be improved and to provide the system. SOLUTION: In this etching treating method for cleaning a cleaning member, the cleaning member set in a cleaning tank is subjected to wet etching treatment using a chemical solution, the chemical solution after the completion of the treatment is moved to an another tank through at least one piping, and the cleaning member is not moved and is subjected to water washing treatment in the same cleaning tank.
申请公布号 JP2001355082(A) 申请公布日期 2001.12.25
申请号 JP20000177241 申请日期 2000.06.13
申请人 CANON INC 发明人 HOSOI KAZUTO;AOIKE TATSUYUKI;MURAYAMA HITOSHI;AKIYAMA KAZUYOSHI;SHIRASAGO TOSHIYASU;TAZAWA DAISUKE;OTSUKA TAKASHI
分类号 G03G5/00;C23F1/08;(IPC1-7):C23F1/08 主分类号 G03G5/00
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