首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Cascaded planar exposure chamber
摘要
申请公布号
AU6470401(A)
申请公布日期
2001.12.03
申请号
AU20010064704
申请日期
2001.05.21
申请人
INDUSTRIAL MICROWAVE SYSTEMS, INC.
发明人
J. MICHAEL DROZD
分类号
H05B6/70;H05B6/74;H05B6/78
主分类号
H05B6/70
代理机构
代理人
主权项
地址
您可能感兴趣的专利
METHOD TO FORM WRAP-AROUND CONTACT FOR FINFET
Fin Structure of Semiconductor Device
Bipolar Semiconductor Device and Method of Manufacturing Thereof
Moisture Barrier Capacitors in Semiconductor Components
ORGANIC LIGHT-EMITTING DIODE (OLED) DISPLAY AND METHOD OF DRIVING THE SAME
THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR AND FLAT PANEL DISPLAY DEVICE HAVING THE THIN FILM TRANSISTOR
ORGANIC LIGHT EMITTING DISPLAY APPARATUS
LIQUID CRYSTAL DISPLAY AND MANUFACTURING METHOD THEREOF
THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME
Packaging Methods for Semiconductor Devices, Packaged Semiconductor Devices, and Design Methods Thereof
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
Semiconductor Devices and Methods of Manufacture Thereof
ISOLATION BETWEEN SEMICONDUCTOR COMPONENTS
DUPLICATE LAYERING AND ROUTING
THERMAL IMPROVEMENT FOR HOTSPOTS ON DIES IN INTEGRATED CIRCUIT PACKAGES
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
FLOWABLE CARBON FILM BY FCVD HARDWARE USING REMOTE PLASMA PECVD
SEMICONDUCTOR CRYSTAL BODY PROCESSING METHOD AND SEMICONDUCTOR CRYSTAL BODY PROCESSING DEVICE
CUT FIRST SELF-ALIGNED LITHO-ETCH PATTERNING
ACCESS DEVICE, FABRICATION METHOD THEREOF, AND SEMICONDUCTOR MEMORY DEVICE HAVING THE SAME
