发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a method for manufacturing the device capable of eliminating a potential instability at a body part of a MOS transistor formed on an element forming region and assuring a current large enough for a size of the formed transistor. SOLUTION: A gate electrode 23 is provided on the element forming region 21 via an insulating film 40. A shallow source region 27 is formed at one side of the electrode 23 and drain region 29 is formed at the other. A body contact part 30 is provided at an outside of the region 27 and is connected to the body part 28.
申请公布号 JP2001332731(A) 申请公布日期 2001.11.30
申请号 JP20000146994 申请日期 2000.05.18
申请人 SEIKO EPSON CORP 发明人 SATO YOKO;EBINA AKIHIKO
分类号 H01L29/786;H01L21/336;(IPC1-7):H01L29/786 主分类号 H01L29/786
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