发明名称 PEELING APPARATUS FOR ETCHED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a peeling apparatus for an etched substrate having a defoaming action. SOLUTION: The showers 3 for spraying a peeling liquid on a substrate 1 are provided inside a peeling tank 12 through which the etched substrates 1 are passed, and a defoaming mat 4 is laid on the bottom of the peeling tank.
申请公布号 JP2001316853(A) 申请公布日期 2001.11.16
申请号 JP20000130334 申请日期 2000.04.28
申请人 SHIN STI TECHNOLOGY KK 发明人 SHIMADA KAZUYUKI;AZUMA KEIGO
分类号 G02B5/20;B05D3/10;B05D7/00;C23F1/00;C23F1/08;G02F1/13;G02F1/1335 主分类号 G02B5/20
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