发明名称 |
PEELING APPARATUS FOR ETCHED SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a peeling apparatus for an etched substrate having a defoaming action. SOLUTION: The showers 3 for spraying a peeling liquid on a substrate 1 are provided inside a peeling tank 12 through which the etched substrates 1 are passed, and a defoaming mat 4 is laid on the bottom of the peeling tank. |
申请公布号 |
JP2001316853(A) |
申请公布日期 |
2001.11.16 |
申请号 |
JP20000130334 |
申请日期 |
2000.04.28 |
申请人 |
SHIN STI TECHNOLOGY KK |
发明人 |
SHIMADA KAZUYUKI;AZUMA KEIGO |
分类号 |
G02B5/20;B05D3/10;B05D7/00;C23F1/00;C23F1/08;G02F1/13;G02F1/1335 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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