PELLICLE

摘要

PROBLEM TO BE SOLVED: To provide a pellicle which is high in light transmittance and is excellent in light resistance even when an F2 is used for an exposure light source. SOLUTION: This pellicle is formed by using a plate of synthetic quartz glass of <=20 ppm in the content of an OH group as a pellicle film. Preferably the thickness of the pellicle film is 1 to 500μ, the variation in the thickness of the pellicle film is <=0.5μand the variation in the OH group content within the surface of the synthetic quartz glass constituting the pellicle film is <=10 ppm.