| 摘要 |
PROBLEM TO BE SOLVED: To easily measure a deviation of an optical axis of an optical microscope used in an alignment sensor or an overlay inspecting instrument. SOLUTION: An evaluation mark 14 arranged adjacently with a bi- or multi- directional diffraction grating pattern is formed on a substrate 6, it is irradiated with illumination light 15 via an illumination optical system, lightness of an image of the evaluation mark 14 is observed by the optical microscope via an optical projection system, and the lightness of the image of the mark 14 is measured to find the direction of the diffraction grating pattern having the lightest lightness. |
