| 摘要 |
PROBLEM TO BE SOLVED: To prevent dropping of developer from a coating liquid supply nozzle on a substrate on which the developer has been already supplied. SOLUTION: A developer supply nozzle 70 which is installed so as to move freely in the X direction in a chamber 60 begins to move from a cleaning tank 85 as a waiting position T to the positive X direction. The nozzle 70 crosses a part above a wafer W without supplying developer and stops at a position P' which proceeds a little from an end portion P of the wafer W. The nozzle 70 then moves in the reverse direction, i.e., the negative X direction while supplying developer to the wafer W. After that, the nozzle 70 stops supply of developer at a position Q' which proceeds a little from an end portion Q of a cleaning tank 85 side of the wafer W, and is returned to the cleaning tank 85. |
