发明名称 |
FERROELECTRIC THIN FILM ELEMENT, SENSOR AND METHOD OF MANUFACTURING FERROELECTRIC THIN FILM ELEMENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a small ferroelectric thin film element which has a superior performance and is easy to process cheaply, a sensor using the same and a method of manufacturing the ferroelectric thin film element. SOLUTION: Buffer layers are formed on an Si substrate, thereby orienting or epitaxially growing metal thin films and ferroelectric thin films through the buffer layers one after another, and the Si substrate and buffer layers are partly removed to form a small ferroelectric thin film element having a superior performance using various etching techniques.</p> |
申请公布号 |
JP2001267645(A) |
申请公布日期 |
2001.09.28 |
申请号 |
JP20000072758 |
申请日期 |
2000.03.15 |
申请人 |
MURATA MFG CO LTD |
发明人 |
RI KOUMIN;TANAKA KATSUHIKO |
分类号 |
G01J1/02;G01J5/34;G01P15/09;H01L27/146;H01L37/02;H01L41/08;H01L41/09;H01L41/18;H01L41/22;H01L41/29;H01L41/316;H01L41/319 |
主分类号 |
G01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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