发明名称 Multi-cusp ion source
摘要 An ion source (26) includes a plasma confinement chamber and a plasma electrode (70) forming a generally planar wall section of the plasma confinement chamber. The plasma electrode (70) has at least one opening (84, 86) for allowing an ion beam (88) to exit the confinement chamber and has a set of magnets (78, 80, 82) that generate a magnetic field extending across the openings (84, 86) in the plasma electrode (70). The openings (84, 86) in the plasma electrode (70) can be fashioned as elongated slots or circular openings aligned along the axis. The ion source (26) can further include a power supply (72) for negatively biasing the plasma electrode relative to the plasma confinement chamber and an insulator (74) for electrically insulating the plasma electrode (70). Cooling tubes can also be provided to transfer heat away from the magnets in the plasma electrode (70).
申请公布号 US6294862(B1) 申请公布日期 2001.09.25
申请号 US19980081545 申请日期 1998.05.19
申请人 EATON CORPORATION 发明人 BRAILOVE ADAM A.;GWINN MATTHEW CHARLES
分类号 H01J27/18;H01J37/08;H01J37/317;H01L21/265;(IPC1-7):H01J27/02;H01J27/08 主分类号 H01J27/18
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