| 发明名称 |
STRUCTURE POUR MASQUE DE LITHOGRAPHIE EN REFLEXION ET PROCEDE POUR SA REALISATION |
| 摘要 |
The invention concerns a structure for a lithographic reflection mask comprising a receive medium (12) on which is fixed a reflector (11) including at least one layer, the reflector (11) being fixed to the receive medium (12) in a reverse manner relative to a manufacturing medium (10) on which it has previously been manufactured and which is then
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| 申请公布号 |
FR2797060(B1) |
申请公布日期 |
2001.09.14 |
| 申请号 |
FR19990009842 |
申请日期 |
1999.07.29 |
| 申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
ROBIC JEAN YVES;ASPAR BERNARD |
| 分类号 |
G03F1/16;G02B5/08;G03F1/14;G03F1/24;H01L21/027;(IPC1-7):G03F1/14;G03F3/06;G03F7/20;G02B5/26;G02B27/18 |
主分类号 |
G03F1/16 |
| 代理机构 |
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