| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment device which can constantly maintain the distance between electrodes by measuring the distance without lowering productivity of, and can improve the quality of the product and productivity of the device, and to provide a method for managing the device. SOLUTION: This plasma treatment device is constituted in such a way that the plate-like upper and lower electrodes 2 and 3 are arranged in parallel with each other in a vacuum chamber 1, and high-frequency power is supplied across the electrodes 2 and 3 from a high-frequency power source 4. This device is provided with a sampler 17 which detects the phase difference between the voltage and current of the highfrequency power, so as to adjust the interval between the electrodes 2 and 3 based on the detected phase difference. Since the detected phase difference varies depending upon the capacitance between the electrodes 2 and 3 and, in addition, the capacitance varies depending upon the distance between the electrodes 2 and 3, the distance can be detected electrically by using the detected phase difference. |
