发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a JFET having an excellent high-frequency characteristic. SOLUTION: A p-type impurity in a gate electrode is actively diffused in a p-type impurity diffusion layer. An electric pn-junction surface in a gate electrode region is formed in the p-type impurity diffusion layer or on the bottom surface thereof. Consequently, an influence of an interface state generated at a regrowth interface on the pn-junction surface is suppressed.
申请公布号 JP2001244456(A) 申请公布日期 2001.09.07
申请号 JP20000051962 申请日期 2000.02.28
申请人 NEC CORP 发明人 KATO TAKEHIKO;OTA KAZUKI;MIYAMOTO HIRONOBU;IWATA NAOTAKA
分类号 H01L21/28;H01L21/20;H01L21/285;H01L21/335;H01L21/337;H01L21/338;H01L29/417;H01L29/778;H01L29/808;H01L29/812;(IPC1-7):H01L29/778 主分类号 H01L21/28
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