发明名称 |
COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a JFET having an excellent high-frequency characteristic. SOLUTION: A p-type impurity in a gate electrode is actively diffused in a p-type impurity diffusion layer. An electric pn-junction surface in a gate electrode region is formed in the p-type impurity diffusion layer or on the bottom surface thereof. Consequently, an influence of an interface state generated at a regrowth interface on the pn-junction surface is suppressed. |
申请公布号 |
JP2001244456(A) |
申请公布日期 |
2001.09.07 |
申请号 |
JP20000051962 |
申请日期 |
2000.02.28 |
申请人 |
NEC CORP |
发明人 |
KATO TAKEHIKO;OTA KAZUKI;MIYAMOTO HIRONOBU;IWATA NAOTAKA |
分类号 |
H01L21/28;H01L21/20;H01L21/285;H01L21/335;H01L21/337;H01L21/338;H01L29/417;H01L29/778;H01L29/808;H01L29/812;(IPC1-7):H01L29/778 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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