METHOD OF DETERMINING MAINTENANCE TIME FOR SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To decide proper maintenance time for a maintenance time determining method for a semiconductor manufacturing apparatus. SOLUTION: In a method of judging a maintenance time for a semiconductor manufacturing device in which a treatment is carried out by the use of corrosive gas in a reaction chamber, a water content inside the reaction chamber is measured with a moisture meter connected to the reaction chamber, when processing is carried out with corrosive gas, and a maintenance time for the semiconductor manufacturing device is decided corresponding to a water content change, when corrosive gas processing is carried out repeatedly.