CERAMIC SUBSTRATE FOR SEMICONDUCTOR PRODUCTION AND INSPECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a ceramic substrate for semiconductor production and inspection device wherein a temperature on the entire heating surface during heating is made uniform and an object to be heated such as silicon wafer or the like can be uniformly heated. SOLUTION: This ceramic substrate for semiconductor production and inspection device is provided with a resistance heating element comprising one or more than two circuits having terminals on both ends of the circuit in the inside or the surface of the ceramic substrate, and the line width adjacent to the terminals on both ends of at least one circuit is larger than those of the other circuits.