发明名称 Particle-free cathodic arc carbon ion source
摘要 A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat conduction in the creation of the particles and strongly increasing the electron emission cooling effects.
申请公布号 US6261421(B1) 申请公布日期 2001.07.17
申请号 US19990467908 申请日期 1999.12.21
申请人 MCGILL UNIVERSITY 发明人 MEUNIER JEAN-LUC;KANDAH MUNTHER
分类号 C23C14/06;C23C14/32;H01J37/32;(IPC1-7):B01J19/08 主分类号 C23C14/06
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