| 摘要 |
<p>A system for performing rapid, high-resolution polycrystalline crystallographic texture analysis, by calculating an Orientation Distribution Function (ODF) from partial pole figures obtained from x-ray diffraction measurements on large samples, e.g., 200 millimeter diameter wafers. The measurement apparatus includes a 2-D area x-ray detector (60) and a collimated x-ray source (55) arranged in a specific, fixed spatial relationship dependent on the properties of the samples to be measured, and also includes a particular wafer motion assembly. The system employs a texture analysis protocol to determine ODF from the severely truncated pole figures thus obtained, through comparison of experimental ODF figures with calculated ones. The resulting system is fast, accurate, amenable to automation, and does not require highly skilled personnel to operate.</p> |
