发明名称 MASTER FOR THERMAL STENCIL PRINTING AND METHOD AND APPARATUS FOR COATING
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for coating which are very effective for coating a substrate with an unstable coating solution apt to bring about separation, sedimentation, flocculation or the like, without any disadvantage, and effective particularly for manufacturing a master for thermal stencil printing having excellent characteristics. SOLUTION: A method and an apparatus for coating a cleaned substrate with a solution in such an extremely unstable state as to bring about sedimentation, flocculation, separation or the like in a short time, without disadvantages such as the sedimentation, flocculation and separation, in the case when the coating solution is applied, particularly for a long time. A master for thermal stencil printing which is manufactured by a process wherein the solution having nonuniformity confirmable visually when it is put in a glass cylinder at a temperature of 20 deg.C and left in a still standing state for 30 minutes is applied on a thermoplastic film and dried to form a porous resin film. In this master, a difference in air permeability is 30% or less in any place in the direction of the width of the master in the case when the thermoplastic film is perforated at a rate of hole area of 20% or more.
申请公布号 JP2001088459(A) 申请公布日期 2001.04.03
申请号 JP19990272421 申请日期 1999.09.27
申请人 RICOH CO LTD;TOHOKU RICOH CO LTD 发明人 ARAI FUMIAKI;TOSHIMOTO MASANORI;NATORI YUJI;TANAKA TETSUO
分类号 B05D3/00;B05C5/02;B05C11/10;B41N1/24;(IPC1-7):B41N1/24 主分类号 B05D3/00
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