发明名称 SEMICONDUCTOR SUBSTRATE CLEANING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a module-type semiconductor substrate cleaning system for treating lengthwise semiconductor substrates. SOLUTION: A system 11 has a plurality of cleaning modules, capable of involving megasonic tank type cleaners 15 and subsequent scrubbers 17, 19. An input module 13 receives sidewise substrates and turns them lengthwise, an output module 23 receives the lengthwise substrates and turns them sidewise, each of the modules (input, cleaning and output) has substrate supports, the substrate supports of the adjacent modules are disposed at equal spacings, these modules are connected by an overhead conveyer mechanism 31 having a plurality of substrate handlers, and these handlers are separated by the same spacings X as the substrate supports of the modules below it.
申请公布号 JP2001060573(A) 申请公布日期 2001.03.06
申请号 JP20000127854 申请日期 2000.04.27
申请人 APPLIED MATERIALS INC 发明人 BRIAN BROWN;ANWAA HUSSEIN;BIRANG MANOOCHER;FRITZ C REDECKER;LERNER ALEXANDER
分类号 B08B7/04;B08B3/02;B08B3/12;H01L21/00;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B7/04
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