PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION

摘要

A method of enabling a photosensitive resin composition to give a satisfactory pattern with greatly improved dry etching resistance while retaining high sensitivity and high resolution; and a photosensitive resin composition obtained by the method. The composition comprises an alkali-soluble resin, a photosensitive material, and a fluorescent material in an amount of 0.0001 to 1.0 part by weight per 100 parts by weight of the photosensitive material, and is characterized in that the weight-average molecular weight of the alkali-soluble resin is higher by at least 5% than that of the alkali-soluble resin used in photosensitive resin compositions containing no sensitivity improver and having the same sensitivity as that photosensitive resin composition.