| 摘要 |
<p>The present invention provides a method of manufacturing a semiconductor device, particularly a solar cell, which is capable of forming a desired electrode pattern by a simple process at low cost. In the method, p-type semiconductor layers are formed on a silicon substrate, and a n-type semiconductor layer is formed on the p-type semiconductor layers, and partially removed in a predetermined pattern by laser abrasion to expose the p-type semiconductor layers, thereby forming an electrode pattern.</p> |
