| 摘要 |
A method of fabricating an X-ray mask includes the steps of forming a membrane on a substrate, forming a first material on the membrane, implanting predetermined ions into the first material, planarizing the membrane by removing a part of the first material and membrane, forming an absorber on the membrane planarized and depositing a second material on the absorber, implanting predetermined ions into the second material, planarizing the absorber by removing a part of the second material and membrane, and patterning the absorber planarized to have a predetermined shape. |
