| 摘要 |
A processing apparatus for efficiently discharging both polishing liquid flowing out a surface plate and mist of polishing liquid produced through polishing with the use of simple measures, is composed of a drain receiver which is provided in proximity with the outer periphery of the surface plate, and which serves as both recovery means for recovering the polishing liquid flowing out from the surface plate and a suction means for sucking up the mist of polishing liquid produced through polishing, a common discharge pipe connecting the drain receiver to a gas-liquid separating mans, for simultaneously transferring both polishing liquid and mist of polishing liquid into the gas-liquid separating means therefrom, and a suction pump and a liquid processing means connected to the gas-liquid separating means.
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