发明名称 CHAMBER AND DEVICE FOR PRODUCING SEMICONDUCTOR USING CHAMBER
摘要 PURPOSE: A chamber of a device for producing a semiconductor is to save costs and hours by separating a dividing member placed on an opening from a body to replace only an etched divided member. CONSTITUTION: A chamber comprises: a body having an inside space and an opening on its one side; a liner having an opening corresponding to the opening of the body; and a divided member arranged on the opening and engaged with the body. When the chamber is required, only the divided member is replaced. A device for producing the semiconductor comprises: a process chamber(20) having an inner space, an opening(28) on its one surface and an anode oxidization film applied on its wall surface; a buffer chamber having an opening corresponding to the opening of the process chamber and moving a wafer to the process chamber; a liner(22) for protecting the anode oxidization film of the process chamber; and a slit valve(24) having one end supported at inside of the process chamber and another end projected out of the process chamber to be connected to the buffer chamber to accomplish an insertion and withdrawal of the wafer.
申请公布号 KR20000050503(A) 申请公布日期 2000.08.05
申请号 KR19990000427 申请日期 1999.01.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, GYEONG JEONG;SON, GWON
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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