发明名称 ANTIREFLECTION FILM AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain an antireflection film having high adhesion between the substrate and antireflection layer and excellent in scratch and wear resistance and surface hardness. SOLUTION: When an antireflection layer is laminated on a substrate film by way of a hard coat layer to obtain an antireflection film, the proportion of Si in the element composition of the surface of the hard coat layer is adjusted to 2-35 at.% of the total amount of Si, C and O by blending the materials in an appropriate ratio or by applying discharge treatment, and the antireflection layer is laminated on the resultant surface of the hard coat layer.
申请公布号 JP2000147209(A) 申请公布日期 2000.05.26
申请号 JP19990248834 申请日期 1999.09.02
申请人 SEKISUI CHEM CO LTD 发明人 HINO MAMORU;NAKAO HITOSHI
分类号 H01J9/20;B32B27/30;G02B1/11;G09F9/00;H01J29/88;H01J29/89 主分类号 H01J9/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利