| 摘要 |
PURPOSE: A cleansing apparatus for a substrate is provided to prevent occurrence of spots and stains, to obtain uniform cleansing effect all over the substrate, to perform cleansing in one apparatus and to be used for an assembly line. CONSTITUTION: A cleansing apparatus(1) is used by setting a substrate(W) before cleansing on a loader cassette(9) and operating a start switch by an operator. Then, the substrate is delivered on a substrate supporting part(3) from the loader cassette by a substrate delivery robot(8), and then supported on each front ends of multiple supporting pins protruded from a pin insertion hole(13c) and a pin insertion hole connection part of a first substrate holder. Multiple supporting pins(14a) in front of the moving direction of cleansing nozzles descends at every row all the time when the cleansing nozzles approach when moving the nozzles for cleansing(4,5,6,7) along the bottom of the substrate from one end of a rack base(16). But the substrate is supported on each front end of the supporting pins. The substrate is supported repeatedly on the front ends according to the ascending of the supporting pin at every row when each cleansing nozzle passes. Accordingly, the four cleansing nozzles don't interrupt the supporting pin, and passing sequentially between the substrate and a first substrate holder(13) while cleansing the bottom of the substrate. And the bottom of the substrate is cleansed by an ultra violet ray cleansing, a hydrogen water cleansing, an ozone water cleansing and a rinsing cleansing by the cleansing nozzles.
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