| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner and exposure method for operating exact exposures, even if a circuit pattern is extremely fine. SOLUTION: Plural charts Ci for measuring illuminance distribution and charts Cs for measuring synchronizing precision are formed on a reticle R. The chart Ci for measuring illuminance distribution is provided with first - fourth periodic patterns RMp1-RMp4. The chart Cs for measuring synchronization precision is provided with first and second measurement patterns RMs1 and RMs2. Then, each of the pattern RMp1-RMp4, RMs1, and RMs2 is illuminated with exposing lights, and projected images passing through the projecting optical system of the patterns are detected through openings on a reference board arranged on a wafer stage by a light-receiving sensor. Thus, illuminance distribution in the exposure area of the exposing lights and the precision of the synchronous movement of the reticule stage, and the wafer stage can be measured based on received light quantity signals from the light-receiving sensor.
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