发明名称 Method and apparatus for polishing a hard disk substrate
摘要 Substrates to be used in manufacturing hard disks are polished in a two-step process entailing a coarse and fine polishing in a single polishing machine. The use of this method and apparatus eliminates the need for two separate polishing machines and for transferring the disks from one polishing machine to another. Furthermore, the overall quality of hard disk substrates polished by this method and apparatus, including smoothness, flatness and edge roll-off, is superior to that achieved by the prior art.
申请公布号 US6045437(A) 申请公布日期 2000.04.04
申请号 US19970804053 申请日期 1997.02.21
申请人 TAN THAP, INC. 发明人 TANDON, SHAM;TANDON, SUMAN;SESHAN, RAM
分类号 B24B37/04;B24B57/02;(IPC1-7):B24B5/00;B24B29/00 主分类号 B24B37/04
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