发明名称 Semiconductor structures with trench contacts
摘要 Semiconductor structures such as the trench and planar MOSFETs (UMOS), trench and planar IGBTs and trench MCTs using trenches to establish a conductor. Improved control of the parasitic transistor in the trench MOSFET is also achieved and cell size and pitch is reduced relative to conventional structures.
申请公布号 US6037628(A) 申请公布日期 2000.03.14
申请号 US19970885922 申请日期 1997.06.30
申请人 INTERSIL CORPORATION 发明人 HUANG, QIN
分类号 H01L21/331;H01L21/336;H01L29/417;H01L29/739;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113 主分类号 H01L21/331
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