发明名称 |
Apparatus for retaining a workpiece in a process chamber within a semiconductor wafer processing system |
摘要 |
Apparatus for retaining a workpiece in a process chamber of a semiconductor wafer processing system. The apparatus has a thermal transfer element, an electrostatic chuck on top of the thermal transfers element and a clamping ring that secures the chuck to the thermal transfer element in a predefined orientation. The detachable, "keyed" chuck permits rapid exchange of wafer support platforms for increased productivity and consistent placement of same upon the thermal transfer element for reliable processing conditions.
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申请公布号 |
US6034863(A) |
申请公布日期 |
2000.03.07 |
申请号 |
US19970968217 |
申请日期 |
1997.11.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MAROHL, DAN A.;BRODINE, JEFFREY A.;SCHIAVO, JR., TONY P. |
分类号 |
H01L21/683;(IPC1-7):H02N13/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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