| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent the disconnection of lower layer metallic wiring and to provide a liquid crystal display device having high reliability and high aperture ratio by forming a plurality of apertures in the lower layer metallic wiring of portions which are the contact regions of terminal parts. SOLUTION: After a metallic film having small specific resistance is deposited by a sputtering method, etc., on the surface of a transparent insulating substrate 1, this metallic film is patterned by using a resist formed by a photomechanical process, by which gate electrodes and the lower layer metallic wiring are formed. At this time, a plurality of the apertures 22 of a rectangular shape are randomly formed at the lower layer metallic wiring 3 of the portion which is the contact region 21 of the terminal part 20. The expansion of the etched regions is suppressed by the apertures 22 formed in the lower layer metallic wiring 3 and the disconnection of the lower layer metallic wiring 3 may be prevented even if an etchant penetrates through the film defect parts of the gate insulating film in the contact region 21 of the terminal part 20 and etches the lower layer metallic wiring 3 consisting of Al or Al alloy.</p> |
