SEMICONDUCTOR DEVICE HAVING SPACER AND ANTI-REFLECTIVE CAP AND METHOD THEREOF AND METHOD FOR MANUFACTURING PHOTORESIST USING THEM

摘要

PURPOSE: A semiconductor device is provided to prevent effectively reflection of light from a reflective pattern. CONSTITUTION: The semiconductor device comprises: a semiconductor substrate(100); a reflective pattern(104p, 106p) formed on the semiconductor device; an anti-reflective cap(110p) formed on the reflective pattern; and an anti-reflective spacer(130s) formed on a side wall of the reflective pattern. The anti-reflective cap(110p) functions as a interference type anti-reflective film reducing below 20% a reflection ratio by offsetting a reflection light reflected from the reflective pattern surface and a light reflected from the anti-reflective cap surface out of a light input from an upper area of the anti-reflective cap.