METHOD AND DEVICE FOR CORRECTING PROXIMITY EFFECTS

摘要

The present invention relates to a method for determining the precompensated pattern of exposure doses of an electron beam required per pattern position to obtain a desired pattern in a coating on a substrate, comprising of: determining the smearing function of the electron beam; determining the precompensated pattern with the smearing function and the desired pattern, wherein the determination is performed such that the exposure doses contain almost exclusively positive values and the exposure doses are at least to some extent smooth relative to each other.